The invention discloses a mask used for forming word lines, a semiconductor memory device, and a test structure. The mask includes two or more spacing-arranged graphic units. The graphic units includelead wire welding pad graphics, connecting line graphics and connecting structure graphics. The connecting structure graphics, the lead wire welding pad graphics and the connecting line graphics areonly distributed in a first direction and a second direction perpendicular to each other; and the mask used for forming the word lines are neatly arranged and are distributed at right angles. Correspondingly, connection structures, lead wire welding pads and connecting lines used for connecting the word lines of memory cell arrays in the semiconductor memory device are also only distributed in thefirst direction and the second direction perpendicular to each other, that is, oblique line parts do not appear in the word lines, and therefore, the formed line width of the connection lines of theword lines is uniform, and the performance of the semiconductor memory device can be improved. In addition, the test structure is used for checking the validity of the word lines.