The invention relates to a method for improving molybdenum and alloy sputtering target material grain uniformity. The method comprises the steps that firstly, molybdenum powder with the fisher particle size being 2.0 to 4.5 micrometers is subject to ball grinding and grading, and the content of particles, below one micrometers, in the molybdenum powder is below 5%, the content of particles, below0.5 micrometer, in the molybdenum powder is below 1%, and the molybdenum powder is mixed with alloy powder with the fisher particle size being 5 to 20 micrometers evenly to obtain mixed powder; secondly, the mixed powder is subjected to cold isostatic pressing forming, and a pressing plate blank is obtained; thirdly, the pressing plate blank is sintered at the temperature of 1750 to 2150 DEG C andis subjected to heat preservation for 2 to 8 hours, and a sintering blank is obtained; fourthly, the sintered blank is rolled and deforms to obtain a rolled blank, the cogging temperature ranges from1350 to 1500 DEG C, and the final rolling temperature ranges from 1100 to 1400 DEG C; fifthly, the rolled blank is annealed for one to four hours in the vacuum or hydrogen atmosphere at the temperature of 1050 to 1250 DEG C, and the sputtering target material is obtained. Through the method, the grain uniformity in the molybdenum and alloy sputtering target material small area and between the areas can be improved, the sputter coating microcosmic and whole uniformity can be ensured, and the quality, the service life and the product consistency of related electronic element function films canbe improved.