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CN109427530A 护罩以及包括该护罩的衬底处理系统 无效 - 撤回

护罩以及包括该护罩的衬底处理系统
摘要：
提供了护罩以及包括该护罩的衬底处理系统。衬底处理系统可以包括处理室、支撑体以及等离子体源，所述等离子体源在竖直方向上与所述支撑体间隔开。所述衬底处理系统还可以包括护罩，所述护罩被构造为在其中容纳所述等离子体。所述护罩可以包括侧壁部以及第一凸缘部，所述第一凸缘部从所述侧壁部水平地延伸并且包括贯穿所述第一凸缘部的多个第一狭缝。所述第一凸缘部可以限定第一开口，并且所述支撑体的一部分延伸穿过所述第一开口。所述侧壁部可以包括多个第二狭缝，所述多个第二狭缝中的每一个可以贯穿所述侧壁部，并可以从所述多个第一狭缝之一朝向所述等离子体源延伸。
摘要（英）：

Shrouds and substrate treating systems including the same are provided. Substrate treating systems may include a process chamber, a supporter, and a plasma source that is spaced apart from the supporter in a vertical direction. The substrate treating systems may also include a shroud configured to contain the plasma therein. The shroud may include a sidewall portion and a first flange portion extending horizontally from the sidewall portion and including a plurality of first slits that extend through a thickness of the first flange portion. The first flange portion may define a first opening,and a portion of the supporter may extend through the first opening. The sidewall portion may include a plurality of second slits, and each of the plurality of second slits may extend through a thickness of the sidewall portion and may extend from one of the plurality of first slits toward the plasma source.

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