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发明公开
CN109870880A 涂胶设备及涂胶方法 无效 - 驳回

涂胶设备及涂胶方法
摘要：
本申请公开了一种涂胶设备及涂胶方法，涂胶设备，包括基板放置区，所述基板放置区用于放置待涂胶基板，所述基板放置区上方设有可移动喷头，所述喷头用于喷涂光刻胶，所述基板放置区下方设有多个激光器。根据本申请实施例提供的技术方案，通过在涂胶设备中增加多个激光器进行基板的边涂胶边固化，能够有效防止基板在传送的过程中引起的光刻胶不规则流动，提高了曝光前光刻胶膜层的均一性，提升了曝光的精度，有效防止了光刻胶残留等不良，同时将光刻胶涂覆和固化进行整合，节省了后续的步骤，降低了单件产品的生产时间。
摘要（英）：

The invention discloses gumming equipment and a gumming method. The gumming equipment comprises a substrate placement area, wherein the substrate placement area is used for placing a substrate to be gummed, a movable shower nozzle is arranged above the substrate placement area and is used for spraying photoresist, and a plurality of lasers are arranged below the substrate placement area. Accordingto the technical scheme provided by the embodiment of the invention, the plurality of lasers are added in the gumming equipment to carry out the edge gumming edge curing of the substrate, photoresistirregular flowing caused in a substrate transmission process can be effectively avoided, the evenness of a photoresist film layer before exposure is improved, exposure accuracy is improved, defects,including photoresist residue and the like, can be effectively avoided, and meanwhile, photoresist coating and curing is integrated to save subsequent steps and shorten the production time of a singleproduct.

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