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发明公开
CN110119064A 表膜和包括其的掩模版 审中-实审

表膜和包括其的掩模版
摘要：
本发明涉及表膜和包括其的掩模版。提供待用于光刻工艺的表膜。该表膜包括如下的膜，所述膜的至少一部分包括碳同素异形体。所述膜具有第一表面和与所述第一表面相反的第二表面，该膜包括包含掺杂剂的掺杂区域，该掺杂区域与所述第一表面相邻，所述掺杂剂包括硼或氮的至少一种，以及所述掺杂区包括所述掺杂剂的至少一种的原子与碳原子之间的键。
摘要（英）：

Provided is a pellicle to be used in a photolithography process. The pellicle a film, at least a portion of which includes carbon allotropes. The film has a first surface and a second surface facing the first surface, the film comprises a doped region including dopants, the doped region adjacent to the first surface, the dopants include least one of boron or nitrogen, and the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.

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