The invention discloses a nested micro-trap structure for inhibiting secondary electron emission and a preparation method, and relates to the field of physical electronics. The nested micro-trap structure for inhibiting the secondary electron emission is of a double nested hole structure, a plurality of secondary small hole structures are contained in a primary large hole, the primary large hole serves as a primary trap, and the multiple secondary small hole structures serve as nested traps; and the integral two-dimensional nested trap structure is constructed on a substrate material and is ofthe double nested hole structure, and metal sputtering is carried out on the double nested hole structure so as to form a nano-scale membrane. The invention further discloses the preparation method for the nested micro-trap structure. According to the nested micro-trap structure and the preparation method, the multi-stage multiplication effect generated by secondary electron emission and re-emission in the trap structure can be effectively inhibited, and therefore the total secondary electron emission inhibition effect on the surface of the material is improved. The invention provides the preparation method for the nested micro-trap structure.