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Invention Publication
CN110506234A 抗蚀剂组合物和使用其的图案形成方法、以及化合物和树脂 无效 - 撤回

抗蚀剂组合物和使用其的图案形成方法、以及化合物和树脂
Abstract:
提供抗蚀剂组合物和使用其的图案形成方法、以及化合物和树脂，所述抗蚀剂组合物包含1种以上的丹宁化合物，所述丹宁化合物选自由结构中包含至少一个酸解离性反应基团的丹宁和其衍生物、以及将它们作为单体而得到的树脂组成的组。
Abstract(English):

A resist composition is provided which contains at least one type of tannin compound selected from the group consisting of a tannin containing at least one acid dissociable reactive group in the structure, a derivative of said tannin, and a resin obtained with said tannin or derivative as a monomer; also provided are a pattern forming method using said resist composition, and a compound and a resin.

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