A method of fabricating a photomask is provided herein. In some examples, a layout for forming an integrated circuit device is received. The layout includes a set of printing features. A region of thelayout is identified. The region is at a distance from the set of printing features such that an exposure region associated with a feature in the region does not affect a set of exposure regions associated with the set of printing features. A plurality of non-printing features is inserted into the region. A photomask is fabricated based on the layout.