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发明授权
CN1669121B 曝光用转写掩模及曝光用转写掩模的图形更换方法 失效 - 权利终止

曝光用转写掩模及曝光用转写掩模的图形更换方法
摘要：
本发明为具备具有各自形成预定图形开口的多个单元的掩模部的曝光用转写掩模。所述多个单元各自根据在该单元上形成的开口图形，在使带电粒子从该单元一侧照射时，将该带电粒子束透过至该单元另一侧。由此，在该单元另一侧上配置被处理基板时，在该被处理基板上转写所述单元的开口图形，进而在该被处理基板上形成曝光图形。此外，在所述掩模部上，所述多个单元的一部分或全部可以更换。
摘要（英）：

The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the plurality of cells is adapted to make the charged particle beam pass through itself to the other side thereof based on the pattern ofthe opening formed in the cell. Thus, when a substrate to be processed is arranged on the other side of the cell, the pattern of the opening formed in the cell is transferred to the substrate to be processed and hence an exposure pattern is formed on the substrate to be processed. The feature of the present invention is that a part of or all the plurality of cells can be exchanged at the mask portion.

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