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发明授权
CN1674225B 替代衬底 失效 - 权利终止

替代衬底
摘要：
本发明公开了一种替代衬底及使用该替代衬底的衬底处理方法。使用筒式旋转清洗设备进行清洗等的衬底处理时，除了增加替代衬底的使用次数之外，同时抑制破损的碎片飞散，降低半导体器件的制造成本。替代衬底(dummy substrate)(100)在构造上是在硅衬底(101)上施加树脂涂层(102)，除了增加替代衬底(100)的强度之外，也防止处理当中硅衬底破损时其碎片或粉末飞散污染处理设备内部。而且，由于树脂涂层(102)是使用耐药性树脂，能够抑制药液的清洗处理对替代衬底(100)的蚀刻，提高可能的重复使用次数。
摘要（英）：

A dummy substrate is obtained by covering a silicon substrate with a resin coating. This increases the strength of the dummy substrate, prevents pieces and particles of the silicon substrate from scattering, and even when the dummy substrate is damaged during processing, prevents them from contaminating a processing apparatus. The use of a chemical-resistant resin for the resin coating restrains the dummy substrate from being etched by a cleaning process using a chemical solution and increases the number of times that the dummy substrate can repeatedly be used.

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