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发明公开
CN1987662A 光刻装置和器件制造方法 有权

光刻装置和器件制造方法
摘要：
一种光刻装置，包括配置成调节辐射光束的照明系统，将构图部件支撑在投影平面中的构图部件支撑件，该构图部件对辐射光束构图，保持基底的基底台；将图形化光束投影到基底上的投影系统，和交换装置，该交换装置用于在投影过程中与保持可交换对象的可交换对象支撑件交换可交换对象。该交换装置包括装载单元和卸载单元，每一装载单元和卸载单元都具有保持可交换对象的保持装置。该保持装置大体上彼此相邻地定位并配置成使可交换对象保持在与一平面大体上平行的平面中，其中可交换对象在投影过程中保持在可交换对象支撑件中。该可交换对象支撑件与每一保持装置交换可交换对象。
摘要（英）：

A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.

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