Provided are a CMOS image sensor and a method for fabricating the same. The image sensor comprises a light receiving element, and a nanopillar formed at an upper end of the light receiving element. Amethod for fabricating a CMOS image sensor, the method comprising steps of: inducing a plasma discharge and forming nanodusts in a light receiving region; etching the light receiving region using thenanodusts as a mask; and removing the nanodusts.