Electron beam evaporation source in the ultrahigh vacuum system is that assembly, ion collection piece (7), filament (5), locating hole post (4), the metal source stick (3) of metal source stick, positive high voltage power supply, sunshade (8) and growth rate meter (9) is peripheral for cooling water cover (6) including the rod -shaped metal source material, filament support metal column (1) and linear drive ware (2), and it is just high -pressure that positive high voltage power supply is applying the metal source stick, thermoelectron that the electron beam evaporation 0 silky hair was penetrated, the metal source stick is heated by hot electron bombardment to be launched the metal source atomic beam with very low speed to the enough high temperature after and becomes the evaporation source, is equipped with one sunshade (8) on the evaporation source, shelters from the evaporation and restraint when stopping the evaporation, is equipped with a concentric hole on the sunshade, lets the evaporation restraint when film growth is opened to the sunshade and passes through, the locating hole post looses and injects the source rod in axial precession to make the source rod in the adjustment position also all the time in the evaporation source is vertical in the heart, have an ion collection piece on the evaporation source transmit path.