The utility model discloses an arc ion plating device. The device consists of a vacuum chamber, a vacuum pumping system, four groups of arc sources and a rotating baffle arranged in front of the arc sources, wherein the rotary baffle plate comprises a cleaning baffle plate and a deposition grid mesh; the rotating disc is suspended at the upper part of the vacuum chamber; the method can effectivelyprevent large particles from polluting the coating structure and reducing the performance, can effectively improve the heating, cleaning, etching and ion implantation effects on the base material, significantly improves the binding force between the subsequently prepared hard protective coating and the base material, and can be used in the field of preparation of hard protective films and coatings on the surfaces of cutters, molds, mechanical parts and the like.