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实用新型
CN2793916Y 快速高温处理的装置 失效 - 权利终止

快速高温处理的装置
摘要：
本实用新型是一种半导体基板的快速高温处理的装置，该装置包括一热源与一反射器，该热源提供快速高温处理的辐射热能，该反射器将该辐射热能予以反射，并将反射的辐射热能导至半导体基板的背面。本实用新型的效果在于热源发出的辐射热能被导至半导体基板的背面，而半导体基板的正面未被辐射热能所照射，于是，半导体基板正面的图案不会影响到热流的均匀性，再者，由于热源并未安置于半导体基板的正面，便可在半导体基板的正面设置一高温计，由此可以准确地量测半导体基板正面的实际温度，以对热源的个别加热灯管所发射的辐射热能进行实时控制，而达成热能均匀分布。
摘要（英）：

The utility model relates to a rapid high-temperature processing device for semiconductor base plates, which comprises a heat source and a reflector, wherein the heat source provides radiation heat energy for the rapid high-temperature processing; the reflector reflects the radiation heat energy and conducts the reflected radiation heat energy to the back side of a semiconductor base plate. The utility model has the advantages that the radiation heat energy transmitted by the heat source is conducted to the back side of the semiconductor base plate, and the front side of the semiconductor base plate is not irradiated by the radiation heat energy, so patterns on the front side of the semiconductor base plate have no influence on the uniformity of heat flow; in addition, the heat source is not arranged on the front side of the semiconductor base plate, and a pyrometer can be arranged on the front side of the semiconductor base plate, so the actual temperature of the front side of the semiconductor base plate can be precisely measured, the radiation heat energy transmitted by an individual heating strip lamp of the heat source can be control in real time so as to obtain the uniform distribution of the heat energy.

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