发明公开
- 专利标题: A system for positioning a utilization device
- 专利标题(中): 系统zur Einstellung einesGerätes。
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申请号: EP80101308.7申请日: 1980-03-13
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公开(公告)号: EP0017044A2公开(公告)日: 1980-10-15
- 发明人: Phillips, Edward H.
- 申请人: EATON-OPTIMETRIX INC.
- 申请人地址: 4001 North First Street San Jose California 95134 US
- 专利权人: EATON-OPTIMETRIX INC.
- 当前专利权人: EATON-OPTIMETRIX INC.
- 当前专利权人地址: 4001 North First Street San Jose California 95134 US
- 代理机构: Liesegang, Roland, Dr.-Ing.
- 优先权: US25917 19790402
- 主分类号: G03B41/00
- IPC分类号: G03B41/00
摘要:
Full aperture focus detection apparatus produces an amplified differential signal having a magnitude and a polarity indicative of the extent and direction, relative to the image plane of a projection lens, that a selected portion of the upper surface of a semiconductive wafer is out of focus with respect to that image plane. Lens positioning apparatus moves the projection lens by an amount and in a direction corresponding to the magnitude and polarity of this signal to position the image plane of the projection lens at the selected portion of the upper surface of the semiconductive wafer. A chuck on which the semiconductive wafer is held may be differentially leveled at three selected off-center locations by leveling apparatus so that the chuck may be raised or lowered at any of those locations to position the selected portion of the upper surface of the semiconductive wafer in a plane parallel to the image plane of the projection lens.
公开/授权文献
- EP0017044B1 A system for positioning a utilization device 公开/授权日:1985-07-03
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