发明公开
EP0028486A1 Photosensitive composition and pattern-forming method
失效
Lichtempfindliche Zusammensetzung und Verfahren zur Herstellung eines Musters。
- 专利标题: Photosensitive composition and pattern-forming method
- 专利标题(中): Lichtempfindliche Zusammensetzung und Verfahren zur Herstellung eines Musters。
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申请号: EP80303760.5申请日: 1980-10-23
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公开(公告)号: EP0028486A1公开(公告)日: 1981-05-13
- 发明人: Hayashi, Nobuaki , Akagi, Motoo , Miura, Kiyoshi , Odaka, Yoshiyuki
- 申请人: Hitachi, Ltd.
- 申请人地址: 5-1, Marunouchi 1-chome Chiyoda-ku, Tokyo 100 JP
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: 5-1, Marunouchi 1-chome Chiyoda-ku, Tokyo 100 JP
- 代理机构: Paget, Hugh Charles Edward
- 优先权: JP136413/79 19791024
- 主分类号: G03C1/70
- IPC分类号: G03C1/70 ; G03F7/08
摘要:
A photosensitive composition used in forming patterns for colour picture tubes comprises (a) a copolymer of acrylamide and diacetoneacrylamide and (b) a water soluble aromatic bisazide compound. This composition is improved by incorporating a sulfonated vinyl monomer such as sodium-p-styrene-sulfonate in the copolymer. This composition has the advantage that it follows a reciprocal failure law; i.e. the degree of cross linkage of B is related to the intensity i and exposure time t of irradiation by the equation B =f(i.t.P) where p is Schwarzschild's constant, which is in the range 0
公开/授权文献
- EP0028486B1 Photosensitive composition and pattern-forming method 公开/授权日:1984-03-14
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