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公开(公告)号：EP0388813B1
公开(公告)日：1997-12-10
申请号：EP90105012.0
申请日：1990-03-16
发明人： Ueno, Takumi , Shiraishi, Hiroshi , Hayashi, Nobuaki , Fukuma, Emiko (née Aoki) , Tadano, Keiko
CPC分类号： G03F7/039 , Y10S430/115 , Y10S430/122
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公开(公告)号：EP0042704B1
公开(公告)日：1985-03-20
申请号：EP81302620.0
申请日：1981-06-12
申请人： Hitachi, Ltd.
发明人： Morishita, Hajime , Kohashi, Takahiro , Hayashi, Nobuaki , Akagi, Motoo , Uchino, Shoichi , Nonogaki, Saburo
CPC分类号： H01J29/225 , C09B67/0079 , G03F7/28
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3.发明公开Photosensitive composition and method of forming a pattern employing the composition 失效感光性组合物和形成使用组合物的图案的方法
公开(公告)号：EP0042704A3
公开(公告)日：1982-08-25
申请号：EP81302620
申请日：1981-06-12
申请人： Hitachi, Ltd.
发明人： Morishita, Hajime , Kohashi, Takahiro , Hayashi, Nobuaki , Akagi, Motoo , Uchino, Shoichi , Nonogaki, Saburo
CPC分类号： H01J29/225 , C09B67/0079 , G03F7/28
摘要： photosensitive composition for use in forming color picture tubes contains an aromatic diazonium compound of the general formula:
where R 1 and R 2 are straight chain alkyl radicals, R 3 and R 4 are each one of H, CH 3 or OCH 3 except that R 3 and R 4 cannot both be H, and A is CL½ZnCl 2 , BF 4 or HSO 4 . The sensitivity of the composition is approximately 10 - 20% higher than that of conventional compositions.-
4.发明授权
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公开(公告)号：EP0620500A3
公开(公告)日：1996-01-03
申请号：EP94105635.0
申请日：1994-04-12
发明人： Uchino, Shoichi , Migitaka, Sonoko , Ueno, Takumi , Onozuka, Toshihiko , Shirai, Seiichirou , Moriuchi, Noboru , Sasaki, Mamoru , Hashimoto, Michiaki , Hayashi, Nobuaki
CPC分类号： G03F7/022 , G03F7/004 , G03F7/0045 , G03F7/0085
摘要： Herein is disclosed a resist which comprises a water repellent compound having a functional group of which water repellent ability disappears through a nucleophilic substitution reaction with alkali or at least two functional groups, in one molecule, of which water repellent ability disappears through a reaction with alkali, and a permeability-variable composition of which alkaline solution-permeability is changed by radiation exposure or radiation exposure and baking after radiation exposure, said resist being excellent in sensitivity to UV light, electron beam, X-ray and other radiations, high in resolution capability and developable with aqueous alkaline solution; as well as a pattern forming method using said resist.
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公开(公告)号：EP0200110B1
公开(公告)日：1988-09-28
申请号：EP86105341.1
申请日：1986-04-17
申请人： HITACHI, LTD.
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公开(公告)号：EP0100920A1
公开(公告)日：1984-02-22
申请号：EP83107030.5
申请日：1983-07-18
申请人： HITACHI, LTD.
CPC分类号： H01J29/225 , G03C1/52 , G03F7/28
摘要： A photosensitive composition becoming sticky upon exposure to light which comprises (a) a salt of a diazonium compound represented by the formula
wherein R, and R 2 are independently -H, -CH 3 , -OCH 3 or
but R 1 and R 2 cannot be
at the same time; and R 3 and R 4 are independently a straight-chain lower alkyl group, and (b) a salt of an aromatic diazonium compound having no -OH group directly bonding to a benzene ring, has an improved sensitivity because it contains the salt of the compound represented by the above formula. By using said photosensitive composition, there is provided a process for forming a pattern of powder coated layer excellent in light sensitivity.-
8.发明公开Pattern forming material and process for forming pattern using the same 失效Bildaufzeichnungsmaterial und Bildaufzeichnungsverfahren damit。
公开(公告)号：EP0388813A2
公开(公告)日：1990-09-26
申请号：EP90105012.0
申请日：1990-03-16
发明人： Ueno, Takumi , Shiraishi, Hiroshi , Hayashi, Nobuaki , Fukuma, Emiko (née Aoki) , Tadano, Keiko
IPC分类号： G03F7/004
CPC分类号： G03F7/039 , Y10S430/115 , Y10S430/122
摘要： A pattern can be formed on a substrated using a pattern forming material comprising (a) a medium, e.g. a polymer or compound, having reactivity for changing solubility in an alkali aqueous solution by a reaction using an acid as a catalyst, and (b) as an acid precursor an alkylsulfonic acid ester obtained from a compound having at least two phenolic hydroxyl groups.
摘要翻译： 可以使用图案形成材料在基底上形成图案，所述图案形成材料包括（a）介质，例如， 具有通过使用酸作为催化剂的反应来改变在碱性水溶液中的溶解度的反应性的聚合物或化合物，和（b）作为酸前体的由具有至少两个酚羟基的化合物得到的烷基磺酸酯。
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9.发明公开Pattern forming composition and process for forming pattern using the same 失效Zusammensetzung zur Strukturherstellung und Strukturherstellungsverfahren damit。
公开(公告)号：EP0377175A2
公开(公告)日：1990-07-11
申请号：EP89123670.5
申请日：1989-12-21
IPC分类号： G03F7/075
CPC分类号： G03F7/0755
摘要： A negative-type pattern (6) forming composition comprising (a) a silanol compound having one or more hydroxyl groups in average bonded to one silicon atom, and (b) an acid precursor, and if necessary, (c) an alkali-soluble resin, can give a pattern (6) with high sensitivity and high resolution.
摘要翻译： 一种负型图形（6）形成组合物，其包含（a）具有一个或多个羟基的硅烷醇化合物，其平均键合到一个硅原子上，和（b）酸前体，如果需要，（c）碱溶性 树脂，可以提供高灵敏度和高分辨率的图案（6）。
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10.发明公开Coating film comprising a negative-working photosensitive composition and pattern-formation method 失效。。。。。。。。。。。。。。。。。。。。。。。。。
公开(公告)号：EP0334381A2
公开(公告)日：1989-09-27
申请号：EP89105301.9
申请日：1989-03-23
IPC分类号： G03F7/008
CPC分类号： G03F7/008
摘要： A negative-working photosensitive composition comprising at least one aromatic azide compound and the balance of a polymer compound, the numerical value of product of the film thickness expressed in micron and the absorbance at 248 nm of a coating film of said photosensitive composition ranging from 0.5 to 1.5. Since said composition has a high sensitivity and a high resolution in the region of exposing wavelength, a fine pattern for practical purposes can be obtained by coating the composition on a substrate, then exposing the thus formed coating film to light to print a predetermined pattern, and developing the film.
摘要翻译： 包含至少一种芳族叠氮化合物和余量的聚合物化合物的负性光敏组合物，所述感光组合物的涂膜的平均值以微米表示的膜的产物数值和248nm处的吸光度范围为0.5 到1.5。 由于所述组合物在曝光波长区域中具有高灵敏度和高分辨率，因此通过将组合物涂布在基材上，然后将这样形成的涂膜曝光以印刷预定图案，可以获得实际用途的精细图案， 并开发电影。
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