发明公开
- 专利标题: Thin-film permanent magnet
- 专利标题(中): 薄膜永久磁铁。
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申请号: EP83100209.2申请日: 1983-01-12
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公开(公告)号: EP0087559A1公开(公告)日: 1983-09-07
- 发明人: Kitada, Masahiro , Yamamoto, Hiroshi , Suenaga, Masahide , Shimizu, Noboru
- 申请人: Hitachi, Ltd.
- 申请人地址: 5-1, Marunouchi 1-chome Chiyoda-ku, Tokyo 100 JP
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: 5-1, Marunouchi 1-chome Chiyoda-ku, Tokyo 100 JP
- 代理机构: Beetz & Partner Patentanwälte
- 优先权: JP29028/82 19820226
- 主分类号: H01F10/16
- IPC分类号: H01F10/16 ; G11B5/62 ; C22C19/07 ; C22C5/04
摘要:
thin-film permanent magnet which is made of a Co - Pt alloy containing 5 - 35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5 x 10 -7 - 1 x 10 -4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000 - about 18,000 G.
公开/授权文献
- EP0087559B1 Thin-film permanent magnet 公开/授权日:1986-08-13
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