发明公开
EP0189272A3 New furanone derivatives, processes for preparation thereof and use thereof
失效
新型呋喃酮衍生物，其制备方法及其用途
- 专利标题： New furanone derivatives, processes for preparation thereof and use thereof
- 专利标题（中）： 新型呋喃酮衍生物，其制备方法及其用途
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申请号： EP86300254申请日： 1986-01-16
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公开(公告)号： EP0189272A3公开(公告)日： 1987-08-19
- 发明人: Okamoto, Masamori , Kohsaka, Masanobu , Uchida, Itsuo , Imanaka, Hiroshi , Umehara, Kazuyoshi , Kitaura, Yoshihiko , Itoh, Yoshikuni , Oku, Teruo , Sawada, Kozo , Suzuki, Yasutaka , Hashimoto, Masashi
- 申请人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 专利权人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 当前专利权人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 优先权： JP650785 19850117; US695001 19850125
- 主分类号： C07D307/60
- IPC分类号： C07D307/60 ; C07D307/58 ; A61K31/365
摘要：
The present invention provides compounds of the general formula:
wherein R 1 is a hydroxyl or protected hydroxyl group or a carboxyl group or a lower alkoxycarbonyl or benzyloxy radical, R 2 is a hydrogen or halogen atom or a halo(lower)alkyl radical, R 3 is a hydrogen atom, a hydroxyl group or a lower alkoxy radical and A is a lower alkylene radical; and the pharmaceutically acceptable salts thereof. The present invention also provides processes for the preparation of these compounds and pharmaceutical compositions containing them and is also concerned with the use thereof.
wherein R 1 is a hydroxyl or protected hydroxyl group or a carboxyl group or a lower alkoxycarbonyl or benzyloxy radical, R 2 is a hydrogen or halogen atom or a halo(lower)alkyl radical, R 3 is a hydrogen atom, a hydroxyl group or a lower alkoxy radical and A is a lower alkylene radical; and the pharmaceutically acceptable salts thereof. The present invention also provides processes for the preparation of these compounds and pharmaceutical compositions containing them and is also concerned with the use thereof.
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