发明公开
EP0218999A2 New quinazoline derivatives, process for their production and pharmaceutical compositions comprising them
失效
喹唑啉衍生物，它们的制备方法和含有它们的药物组合物。
- 专利标题： New quinazoline derivatives, process for their production and pharmaceutical compositions comprising them
- 专利标题（中）： 喹唑啉衍生物，它们的制备方法和含有它们的药物组合物。
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申请号： EP86113559.8申请日： 1986-10-02
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公开(公告)号： EP0218999A2公开(公告)日： 1987-04-22
- 发明人: Hashimoto, Masashi , Oku, Teruo , Ito, Yoshikuni , Namiki, Takayuki , Sawada, Kozo , Kasahara, Chiyoshi , Baba, Yukihisa
- 申请人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 申请人地址： 3, Doshomachi 4-chome Higashi-ku Osaka-shi Osaka 541 JP
- 专利权人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 当前专利权人： FUJISAWA PHARMACEUTICAL CO., LTD.
- 当前专利权人地址： 3, Doshomachi 4-chome Higashi-ku Osaka-shi Osaka 541 JP
- 代理机构： Türk, Gille, Hrabal, Leifert
- 优先权： GB8524663 19851007
- 主分类号： C07D239/96
- IPC分类号： C07D239/96 ; C07D239/95 ; C07D285/24 ; C07D401/06 ; C07D409/06 ; A61K31/505
摘要：
compound of the formula:
in which
R 1 and R 2 are each hydrogen, halogen, lower alkoxy or halo(lower)alkyl,
R 3 is aryl or ar(lower)alkyl, both of which may have one or more suitable substituent(s), or heterocyclic(lower)alkyl,
R 4 is carboxy or protected carboxy,
A is oxygen or sulfur atom,
Y is carbonyl, thiocarbonyl or sulfonyl and
Z is lower alkylene,
and pharmaceutically acceptable salts thereof, processes for their preparation and pharmaceutical compositions comprising them in admixture with pharmaceutically acceptable carriers.
in which
R 1 and R 2 are each hydrogen, halogen, lower alkoxy or halo(lower)alkyl,
R 3 is aryl or ar(lower)alkyl, both of which may have one or more suitable substituent(s), or heterocyclic(lower)alkyl,
R 4 is carboxy or protected carboxy,
A is oxygen or sulfur atom,
Y is carbonyl, thiocarbonyl or sulfonyl and
Z is lower alkylene,
and pharmaceutically acceptable salts thereof, processes for their preparation and pharmaceutical compositions comprising them in admixture with pharmaceutically acceptable carriers.
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