发明公开
- 专利标题: Impurity detector system
- 专利标题(中): Detektorsystem zur Messung von Unreinheiten。
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申请号: EP86300513.8申请日: 1986-01-27
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公开(公告)号: EP0222465A2公开(公告)日: 1987-05-20
- 发明人: Koseki, Yasuo , Yamada, Akira , Ebara, Katsuya , Takahashi, Sankichi , Kuroiwa, Minoru
- 申请人: HITACHI, LTD.
- 申请人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 100 JP
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 100 JP
- 代理机构: Calderbank, Thomas Roger
- 优先权: JP211882/85 19850925
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N33/18 ; G01N15/00
摘要:
An impurity detector (10) atomises a liquid sample by injecting it into a chamber (11) with a gas. In the chamber (11) the liquid is heated, preferably by heating the gas prior to injection, to cause all the liquid to evaporate. The solid impurities contained in the liquid are thus entrained in the gas and carried to a detector region (17). The chamber is arranged so that all the gas and all the particles arrive at the detector region (17). A particle detector (19) measures the number and size of the particles and from that measurement, the concentration of impurities in the sample can be determined. A first measurement is made with the liquid being fed directly to the impurity detector (10), and then a second measurement is made with the liquid being filtered by a filter unit (64) prior to being fed to the impurity detector (10). This permits two separate measurements to be made, and thus calculation of the amounts of soluble and granular impurities present. The system permits on-line operation, and produces accurate results.
公开/授权文献
- EP0222465B1 Impurity detector system 公开/授权日:1990-12-27
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