发明公开
EP0266214A2 Interference film filters, optical waveguides and methods for producing them
失效
Dünnschichtinterferenzfilter，optische Wellenleiter和Verfahren zu ihrer Herstellung。
- 专利标题： Interference film filters, optical waveguides and methods for producing them
- 专利标题（中）： Dünnschichtinterferenzfilter，optische Wellenleiter和Verfahren zu ihrer Herstellung。
-
申请号： EP87309609.3申请日： 1987-10-30
-
公开(公告)号： EP0266214A2公开(公告)日： 1988-05-04
- 发明人: Miura, Yuuji , Baba, Noboru
- 申请人： HITACHI, LTD.
- 申请人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人： HITACHI, LTD.
- 当前专利权人： HITACHI, LTD.
- 当前专利权人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构： Ellis, Edward Lovell
- 优先权： JP258284/86 19861031
- 主分类号： G02B1/10
- IPC分类号： G02B1/10 ; G02B6/12 ; G02B6/10
摘要：
Interference film filters and optical waveguides with low loss of light, including a laminate deposition-formed on a substrate (1,30) by alternate sputtered lamination of a first film (2,4,10) of amorphous Si x C y O z (x:y:z = 1:0.6-1:0-0.5) having refractive index up to 3.4 and an extinction coefficient below 0.1 and a second thin film (3,5,20) of amorphous Si x O y C z (x:y:z = 1:1.8-2:0-0.5) having a low refractive index in comparison with that of the first thin film. The two film types may be sputtered from a single sintered SiC target by varying oxygen content of a sputter gas mixture.
公开/授权文献
信息查询
