发明公开
- 专利标题： Photosensitive compound
- 专利标题（中）： 光敏化合物
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申请号： EP88311462.1申请日： 1988-12-02
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公开(公告)号： EP0323050A3公开(公告)日： 1990-12-19
- 发明人: Ogawa, Kazufumi , Ohno, Keiji , Endo, Masayuki , Nagoya, Mamoru
- 申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD , MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址： 1-2 Doshomachi-3-chome Chuo-ku Osaka JP
- 专利权人： WAKO PURE CHEMICAL INDUSTRIES, LTD,MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人： WAKO PURE CHEMICAL INDUSTRIES, LTD,MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址： 1-2 Doshomachi-3-chome Chuo-ku Osaka JP
- 代理机构： Baillie, Iain Cameron
- 优先权： JP306878/87 19871204; JP309336/87 19871207; JP310737/87 19871208
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
Photosensitive compounds having preferably a functional group such as -SO 2 Cl, -S0 3 H, -SO 3 R,
(R, R', R" being alkyl) on a terminal benzene or naphthalene ring connected via a methylene group and
moiety are improved in sensitivity to light and thermal stability, and thus useful in a photo resist.
(R, R', R" being alkyl) on a terminal benzene or naphthalene ring connected via a methylene group and
moiety are improved in sensitivity to light and thermal stability, and thus useful in a photo resist.
公开/授权文献
- EP0323050B1 Photosensitive compound 公开/授权日：1994-11-02
信息查询
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