发明公开
- 专利标题： Process for purifying nitrogen trifluoride gas
- 专利标题（中）： 净化三氯化磷气体的方法
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申请号： EP89109439.3申请日： 1989-05-24
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公开(公告)号： EP0344612A3公开(公告)日： 1990-05-30
- 发明人: Koto, Nobuhiko , Nishitsuji, Toshihiko , Iwanaga, Naruyuki , Harada, Isao
- 申请人： MITSUI TOATSU CHEMICALS, Inc.
- 申请人地址： 2-5 Kasumigaseki 3-chome Chiyoda-Ku Tokyo 100 JP
- 专利权人： MITSUI TOATSU CHEMICALS, Inc.
- 当前专利权人： MITSUI TOATSU CHEMICALS, Inc.
- 当前专利权人地址： 2-5 Kasumigaseki 3-chome Chiyoda-Ku Tokyo 100 JP
- 代理机构： Schüler, Horst, Dr.
- 优先权： JP135061/88 19880601
- 主分类号： C01B21/083
- IPC分类号： C01B21/083
摘要：
This invention relates to a process for obtaining a high purity nitrogen trifluoride gas which is used as a dry etching agent for semiconductors or a cleaning gas for CVD apparatus, etc., particularly to a process for removing oxygen difluoride. This is a process for purifying a nitrogen trifluoride gas by, after removing hydrogen fluoride from a nitrogen trifluoride crude gas, contacting with at least one aqueous solution containing one selected from the group consisting of sodium thiosulfate, hydrogen iodide and sodium sulfide.
公开/授权文献
- EP0344612B1 Process for purifying nitrogen trifluoride gas 公开/授权日：1993-03-17
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