Process for purifying nitrogen trifluoride gas
    3.
    发明公开
    Process for purifying nitrogen trifluoride gas 失效
    净化三氯化磷气体的方法

    公开(公告)号:EP0344612A3

    公开(公告)日:1990-05-30

    申请号:EP89109439.3

    申请日:1989-05-24

    IPC分类号: C01B21/083

    CPC分类号: C01B21/0832

    摘要: This invention relates to a process for obtaining a high purity nitrogen trifluoride gas which is used as a dry etching agent for semiconductors or a cleaning gas for CVD apparatus, etc., particularly to a process for removing oxygen difluoride. This is a process for purifying a nitrogen trifluoride gas by, after removing hydrogen fluoride from a nitrogen trifluoride crude gas, contacting with at least one aqueous solution containing one selected from the group consisting of sodium thiosulfate, hydrogen iodide and sodium sulfide.

    Exhaust gas treating agent and a method of treating exhaust gas using the agent
    4.
    发明公开
    Exhaust gas treating agent and a method of treating exhaust gas using the agent 失效
    Abgasbehandlungsmittel und Verfahren zur Behandlung von Abgas damit。

    公开(公告)号:EP0666101A1

    公开(公告)日:1995-08-09

    申请号:EP95300668.1

    申请日:1995-02-02

    IPC分类号: B01D53/68 B01D53/86

    CPC分类号: B01D53/68 B01D53/8659

    摘要: A method of treating an exhaust gas comprises the steps of loading into a column an exhaust gas treating agent containing as a main component a metal a surface of which is fluorinated previously; passing through the column the exhaust gas containing nitrogen trifluoride as a component to be treated; and contacting the exhaust gas with the exhaust gas treating agent.

    摘要翻译: 处理废气的方法包括以下步骤:将含有表面氟化的金属作为主要成分装载到废气处理剂中, 将含有作为待处理成分的三氟化氮的废气通过该塔, 并使废气与废气处理剂接触。

    Process for purifying nitrogen trifluoride gas
    6.
    发明公开
    Process for purifying nitrogen trifluoride gas 失效
    净化三氯化磷气体的方法

    公开(公告)号:EP0337294A3

    公开(公告)日:1991-04-10

    申请号:EP89106050.1

    申请日:1989-04-06

    IPC分类号: C01B21/083

    CPC分类号: C01B21/0832

    摘要: A process of the present invention can effectively decompose, particularly, dinitrogen difluoride present in a nitrogen trifluoride gas to remove it from the gas. This process for purifying the nitrogen trifluoride gas is characterized by comprising the step of heating the nitrogen trifluoride gas containing at least dinitrogen difluoride as an impurity at a tenperature of 150 to 600°C in a metallic vessel the inner wall of which is lined with a solid fluoride, or in a packing layer of the solid fluoride in the vessel.

    Process for the preparation of partially-substituted fluorosilane
    8.
    发明公开
    Process for the preparation of partially-substituted fluorosilane 失效
    维斯特伐利亚州赫尔斯特朗伊斯兰德(Tilsubstituierten Fluorosilans)。

    公开(公告)号:EP0599278A1

    公开(公告)日:1994-06-01

    申请号:EP93118847.8

    申请日:1993-11-24

    IPC分类号: C01B33/107 C01G9/04

    CPC分类号: C01B33/107 C01G9/04

    摘要: A process is provided by the present invention for the preparation of a partially-substituted fluorosilane represented by the following formula: SiH n F 4-n wherein n stands for an integer of 1 to 3. The process comprises converting a corresponding partially-substituted chlorosilane into the partially-substituted fluorosilane by halogen replacement while using a fluorinating agent. The fluorinating agent is anhydrous zinc fluoride having at least 500 Å in terms of the size of crystallites of the (110) plane.

    摘要翻译: 本发明提供了制备由下式表示的部分取代的氟硅烷的方法:SiHnF4-n,其中n表示1至3的整数。该方法包括将相应的部分取代的氯代硅烷转化成部分 在使用氟化剂时通过卤素取代取代的氟硅烷。 氟化剂是关于(110)面的微晶尺寸至少为500的无水氟化锌。

    Process for purifying nitrogen trifluoride gas
    9.
    发明公开
    Process for purifying nitrogen trifluoride gas 失效
    Verfahren zur Reinigung von Stickstofftrifluoridgas。

    公开(公告)号:EP0344612A2

    公开(公告)日:1989-12-06

    申请号:EP89109439.3

    申请日:1989-05-24

    IPC分类号: C01B21/083

    CPC分类号: C01B21/0832

    摘要: This invention relates to a process for obtaining a high purity nitrogen trifluoride gas which is used as a dry etching agent for semiconductors or a cleaning gas for CVD apparatus, etc., particularly to a process for removing oxygen difluoride. This is a process for purifying a nitrogen trifluoride gas by, after removing hydrogen fluoride from a nitrogen trifluoride crude gas, contacting with at least one aqueous solution containing one selected from the group consisting of sodium thiosulfate, hydrogen iodide and sodium sulfide.

    摘要翻译: 本发明涉及一种获得高纯度三氟化氮气体的方法,该方法用作半导体用干蚀刻剂或用于CVD设备的清洁气体等,特别涉及一种除去二氧化氟的方法。 这是从三氟化氮粗气体中除去氟化氢后,与至少一种含有硫代硫酸钠,碘化氢和硫化钠中的一种的水溶液接触来纯化三氟化氮气体的方法。

    Process for purifying nitrogen trifluoride gas
    10.
    发明公开
    Process for purifying nitrogen trifluoride gas 失效
    Verfahren zur Ra​​ffinierung von Stickstofftrifluoridgas。

    公开(公告)号:EP0337294A2

    公开(公告)日:1989-10-18

    申请号:EP89106050.1

    申请日:1989-04-06

    IPC分类号: C01B21/083

    CPC分类号: C01B21/0832

    摘要: A process of the present invention can effectively decompose, particularly, dinitrogen difluoride present in a nitrogen trifluoride gas to remove it from the gas.
    This process for purifying the nitrogen trifluoride gas is characterized by comprising the step of heating the nitrogen trifluoride gas containing at least dinitrogen difluoride as an impurity at a tenperature of 150 to 600°C in a metallic vessel the inner wall of which is lined with a solid fluoride, or in a packing layer of the solid fluoride in the vessel.

    摘要翻译: 本发明的方法可以有效地分解存在于三氟化氮气体中的二氟化氮,特别是将其从气体中除去。 这种纯化三氟化氮气体的方法的特征在于包括在金属容器内在150-600℃的温度下加热含有至少二氟化二氮二氟化物的三氟化氮气体的步骤,其内壁衬有 固体氟化物,或在容器中的固体氟化物的填充层中。