发明公开
EP0357824A1 A sheet plasma sputtering method and an apparatus for carrying out the method
失效
通过用于处理该方法的带状等离子体流和装置溅射。
- 专利标题： A sheet plasma sputtering method and an apparatus for carrying out the method
- 专利标题（中）： 通过用于处理该方法的带状等离子体流和装置溅射。
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申请号： EP88114691.4申请日： 1988-09-08
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公开(公告)号： EP0357824A1公开(公告)日： 1990-03-14
- 发明人: Uramoto, Joshin , Suzuki, Koichi , Oyama, Takuji , Kojima, Hiroyasu
- 申请人： Uramoto, Joshin , ASAHI GLASS COMPANY LTD.
- 申请人地址： Aza Neura 90-217 Oaza Iwasaki Nisshin-cho Aichi-gun Aichi-ken JP
- 专利权人： Uramoto, Joshin,ASAHI GLASS COMPANY LTD.
- 当前专利权人： Uramoto, Joshin,ASAHI GLASS COMPANY LTD.
- 当前专利权人地址： Aza Neura 90-217 Oaza Iwasaki Nisshin-cho Aichi-gun Aichi-ken JP
- 代理机构： Wächtershäuser, Günter, Prof. Dr.
- 主分类号： H01J37/34
- IPC分类号： H01J37/34 ; H05H1/50 ; C23C14/42
摘要：
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream (1) into a form of sheet (3) by a magnetic field so that ions in the sheet plasma are accelerated to a target (5) which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate (7) arranged opposite the target with respect to the sheet plasma.
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