发明授权
EP0367293B1 Methods of fabricating semiconductor devices having a bipolar transistor
失效
一种用于与双极型晶体管的制造半导体器件的过程
- 专利标题: Methods of fabricating semiconductor devices having a bipolar transistor
- 专利标题(中): 一种用于与双极型晶体管的制造半导体器件的过程
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申请号: EP89120501.5申请日: 1989-11-06
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公开(公告)号: EP0367293B1公开(公告)日: 1998-03-11
- 发明人: Kanda, Akihiro , Fujita, Yoshiro , Hirai, Takehiro , Tanaka, Mitsuo , Esaki, Hideya
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 代理机构: Tiedtke, Harro, Dipl.-Ing.
- 优先权: JP278700/88 19881104
- 主分类号: H01L29/732
- IPC分类号: H01L29/732 ; H01L21/331 ; H01L21/8228 ; H01L27/082
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