发明公开
EP0379594A1 GAS SUPPLY PIPELINE SYSTEM FOR PROCESS EQUIPMENT
失效
LEITUNGSSYSTEM ZUR GASVERSORGUNG EINER PROZESSANLAGE。
- 专利标题： GAS SUPPLY PIPELINE SYSTEM FOR PROCESS EQUIPMENT
- 专利标题（中）： LEITUNGSSYSTEM ZUR GASVERSORGUNG EINER PROZESSANLAGE。
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申请号： EP89908265.5申请日： 1989-07-07
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公开(公告)号： EP0379594A1公开(公告)日： 1990-08-01
- 发明人: OHMI, Tadahiro , NAKAHARA,Fumio , SATOH,Tuyosi , UMEDA, Masaru
- 申请人： Ohmi, Tadahiro
- 申请人地址： 1-17-301, Komegabukuro 2-chome Aoba-ku Sendai-shi Miyagi-ken 980 JP
- 专利权人： Ohmi, Tadahiro
- 当前专利权人： Ohmi, Tadahiro
- 当前专利权人地址： 1-17-301, Komegabukuro 2-chome Aoba-ku Sendai-shi Miyagi-ken 980 JP
- 代理机构： Rees, David Christopher
- 优先权： JP17138388 19880708
- 国际公布： WO1990000633 19900125
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/52 ; C23C14/22 ; C23F4/00 ; H01L21/205 ; H01L21/302 ; H01L21/31
摘要：
A gas supply pipeline system for process equipment, adapted to supply at least two kinds of process gas, and provided with at least two valves (135, 136, 139, 140) installed in each of independent flow passages formed between process gas supply pipelines and a purge gas supply pipe line, and at least two valves (137, 138, 141, 142) installed in each of a plurality of flow passages formed between the process gas supply pipelines and the pipelines in the process equipment. Each of the process gas supply pipelines and each of the pipelines in the process equipment can be purged and vacuumed by at least two valves in each of these flow passages that are opened or closed independently, and the stagnation of a gas in the pipelines not in use can be prevented by introducing a purge gas constantly thereinto.
公开/授权文献
- EP0379594B1 GAS SUPPLY PIPELINE SYSTEM FOR PROCESS EQUIPMENT 公开/授权日：1994-12-07
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