发明公开
- 专利标题： Methods of manufacturing thin film superconductors and superconductor devices
- 专利标题（中）： 薄膜超导体和超导体器件及其制造方法
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申请号： EP90115988.9申请日： 1990-08-21
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公开(公告)号： EP0414205A3公开(公告)日： 1991-07-24
- 发明人: Kohiki, Shigemi , Enokihara, Akira , Higashino, Hidetaka , Hatta, Shinichiro , Setsune, Kentaro , Wasa, Kiyotaka , Kamada, Takeshi , Hayashi, Shigenori
- 申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址： 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 专利权人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址： 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 代理机构： Eisenführ, Speiser & Partner
- 优先权： JP214496/89 19890821; JP214498/89 19890821; JP99702/90 19900416; JP99704/90 19900416; JP101301/90 19900417; JP143104/90 19900531
- 主分类号： H01L39/24
- IPC分类号： H01L39/24 ; H01L39/22
摘要：
There is disclosed a thin film superconductor in which the critical current density obtained from the magnitude of diamagnetization measured at 48 K in an outer magnetic field of 150 Oe is more than 3 mill.A/cm². Also, a manufacturing method for the thin film superconductor is disclosed in which photons having energies larger than ultraviolet rays are irradiated to the thin film superconductor on or after formation of the thin film. Further, manufacturing methods for superconductive magnetic memory, Josephson device and superconductive transistor are disclosed.
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