发明公开
EP0441308A2 Process for preparing printed circuit board having through-hole
失效
Verfahren zur Herstellung einer gedruckten Schaltung mit Loch。
- 专利标题: Process for preparing printed circuit board having through-hole
- 专利标题(中): Verfahren zur Herstellung einer gedruckten Schaltung mit Loch。
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申请号: EP91101500.6申请日: 1991-02-05
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公开(公告)号: EP0441308A2公开(公告)日: 1991-08-14
- 发明人: Yuasa, Hitoshi , Sato, Haruyoshi , Yamasita, Yukio , Yoda, Eiji , Otsuki, Yutaka
- 申请人: NIPPON OIL CO., LTD.
- 申请人地址: 3-12, Nishishinbashi 1-chome Minato-ku Tokyo JP
- 专利权人: NIPPON OIL CO., LTD.
- 当前专利权人: NIPPON OIL CO., LTD.
- 当前专利权人地址: 3-12, Nishishinbashi 1-chome Minato-ku Tokyo JP
- 代理机构: Dipl.-Ing. H. Hauck, Dipl.-Ing. E. Graalfs, Dipl.-Ing. W. Wehnert, Dr.-Ing. W. Döring, Dr.-Ing. N. Siemons
- 优先权: JP26009/90 19900207
- 主分类号: G03F7/038
- IPC分类号: G03F7/038 ; H05K3/42
摘要:
A process for preparing a through-hole printed circuit board having at least one through-hole, involves the steps of: (a) applying an acid-soluble cationic electrodeposit photoresist by electrodeposition all over on a surface of a board covered by an electrically conductive metal layer including the through-hole, while setting the board as a cathode; (b) heating the board passed through the step (a) to a tempeature of 50°C to 120°C; (c) exposing the acid-soluble cationic electrodeposit photoresist to light through a photo-mask having a pattern complementary to a pattern of a circuit to be formed, thereby to cure the photoresist, and then developing with a developer to remove only an uncured portion of the photoresist; (d) applying an alkali-soluble anionic electrodeposit etching resist by electrodeposition on a surface of a portion of the electrically conductive metal layer uncoated with the cured photoresist, while setting the board passed through the step (c) as an anode; (e) heating the board passed through the step (d) to a tempeature of 50 to 120°C; (f) removing a coating of the cured acid-soluble cationic electrodeposit photoresist with an aqueous acid solution; (g) etching a portion of the electrically conductive metal layer exposed by the step (f); and (h) removing the remaining alkali-soluble anionic electrodeposit etching resist with an aqueous alkali solution.
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