Process for preparing printed circuit board having through-hole
    1.
    发明公开
    Process for preparing printed circuit board having through-hole 失效
    Verfahren zur Herstellung einer gedruckten Schaltung mit Loch。

    公开(公告)号:EP0441308A2

    公开(公告)日:1991-08-14

    申请号:EP91101500.6

    申请日:1991-02-05

    IPC分类号: G03F7/038 H05K3/42

    摘要: A process for preparing a through-hole printed circuit board having at least one through-hole, involves the steps of: (a) applying an acid-soluble cationic electrodeposit photoresist by electrodeposition all over on a surface of a board covered by an electrically conductive metal layer including the through-hole, while setting the board as a cathode; (b) heating the board passed through the step (a) to a tempeature of 50°C to 120°C; (c) exposing the acid-soluble cationic electrodeposit photoresist to light through a photo-mask having a pattern complementary to a pattern of a circuit to be formed, thereby to cure the photoresist, and then developing with a developer to remove only an uncured portion of the photoresist; (d) applying an alkali-soluble anionic electrodeposit etching resist by electrodeposition on a surface of a portion of the electrically conductive metal layer uncoated with the cured photoresist, while setting the board passed through the step (c) as an anode; (e) heating the board passed through the step (d) to a tempeature of 50 to 120°C; (f) removing a coating of the cured acid-soluble cationic electrodeposit photoresist with an aqueous acid solution; (g) etching a portion of the electrically conductive metal layer exposed by the step (f); and (h) removing the remaining alkali-soluble anionic electrodeposit etching resist with an aqueous alkali solution.

    摘要翻译: 一种用于制备具有至少一个通孔的通孔印刷电路板的方法,包括以下步骤:(a)通过电沉积在由导电覆盖的板的表面上电沉积的酸溶性阳离子电沉积光致抗蚀剂 包括通孔的金属层,同时将板设置为阴极; (b)将通过步骤(a)的板加热至50℃至120℃的温度; (c)将酸溶性阳离子电沉积光致抗蚀剂曝光通过具有与要形成的电路图案互补的图案的光掩模,从而固化光致抗蚀剂,然后用显影剂显影以除去未固化部分 的光刻胶; (d)通过电沉积在未固化的光致抗蚀剂的未导电的导电金属层的一部分的表面上施加碱溶性阴离子电沉积抗蚀剂,同时使板通过步骤(c)作为阳极; (e)将通过步骤(d)的板加热至50至120℃的温度; (f)用酸水溶液去除固化的酸溶性阳离子电沉积光致抗蚀剂的涂层; (g)蚀刻由步骤(f)暴露的导电金属层的一部分; 和(h)用碱水溶液除去剩余的碱溶性阴离子电沉积抗蚀剂。

    Resin composition for forming durable protection coating and process for forming durable protection coating on substrate
    2.
    发明公开
    Resin composition for forming durable protection coating and process for forming durable protection coating on substrate 失效
    用于制造耐久防护涂层和方法,用于在衬底上制备耐久防护涂层树脂组合物。

    公开(公告)号:EP0430175A1

    公开(公告)日:1991-06-05

    申请号:EP90122659.7

    申请日:1990-11-27

    IPC分类号: G03F7/033

    CPC分类号: G03F7/033 H05K3/287

    摘要: 1. A resin composition for forming a durable protection coating contains (A) an alkali-soluble resin which is a polymer of a conjugated diene and has a monoamidated succinic acid group represented by the following formula (I) of:
    wherein R¹ and R² each stand for a hydrogen atom, a halogen atom or an organic residue having 1 to 3 carbon atoms; and R³ stands for an organic residue having 1 to 16 carbon atoms; (B) a pre-polymer having a photosensitive ethylenic double bond; and (C) a photo polymerization initiator. The mixing ratio by weight of the alkali-soluble resin (A) to the pre-polymer (B) ranges from 1:4 to 4:1. A process for preparing the durable protection coating contains applying the resin composition on a substrate, and exposing the resin composition to ultraviolet ray through a circuit pattern mask to cure the resin composition followed by development and after-curing to form the protection coating.

    摘要翻译: 1.用于形成耐久保护涂层的树脂组合物含有(A)碱可溶性树脂,其全部是共轭服务的聚合物,并且具有由下式(I)表示的单酰胺琥珀酸基团的: worinř <1>和R <2>各自代表一个氢原子,卤原子或具有1至3个碳原子的有机残基; 且R <3>表示在具有1至16个碳原子的有机残基; (B)具有感光乙烯性双键的预聚物; 和(C)光聚合引发剂。 (重量)的碱溶性树脂(A)与预聚物(B)的混合比例为1:4至4:1。 一种制备耐用的保护涂层处理包含涂布在基板上的树脂组合物,并且暴露的树脂组合物,紫外线通过的电路图案掩模以固化随后进行显影和后固化,以形成保护涂层的树脂组合物。 Ë

    Process for producing butadiene oligomer adducts
    3.
    发明公开
    Process for producing butadiene oligomer adducts 失效
    Verfahren zur Herstellung von Addukten von Butadienoligomeren。

    公开(公告)号:EP0373636A1

    公开(公告)日:1990-06-20

    申请号:EP89123071.6

    申请日:1989-12-13

    IPC分类号: C08C19/28

    CPC分类号: C08C19/38

    摘要: The present invention relates to a process for producing butadiene oligomer adducts of (A) a butadiene oligomer or co-­oligomer prepared from a monomer, selected from conjugated diolefins and vinyl-substituted aromatic compounds, and butadiene with (B) an ethylene-α, β-dicarboxyl compound, characterized by heating (A) said butadiene oligomer or co-­oligomer with (B) said compound at a temperature of 120 - 220°C in the presence of 0.005 - 5% by weight of trimethylhydroquinone based on an amount of (A).

    摘要翻译: 本发明涉及由(A)由选自共轭二烯烃和乙烯基取代的芳族化合物的单体制备的(A)丁二烯低聚物或共聚低聚物的丁二烯低聚物加合物的方法,丁二烯与(B)乙烯-α, β-二羧基化合物,其特征在于,在(B)所述化合物的温度为120-220℃,在0.005-5重量%的三甲基对苯二酚存在下,加热(A)所述丁二烯低聚物或共低聚物, (一个)。

    Random copolymer containing derivative of bicyclo (2.2.1) hept-2-ene compound
    4.
    发明公开
    Random copolymer containing derivative of bicyclo (2.2.1) hept-2-ene compound 失效
    双环(2.2.1) - 庚二烯-2-衍生共聚物共聚物。

    公开(公告)号:EP0325260A2

    公开(公告)日:1989-07-26

    申请号:EP89100899.7

    申请日:1989-01-19

    CPC分类号: C08F210/02 C08F4/68

    摘要: A random copolymer comprises recurring units each having the formula of;
    wherein R¹ to R¹⁰ stand for a hydrogen atom or an alkyl group with or without R⁵ being bonded to R⁶ or R¹⁰ via an alkylene group having 1 to 3 carbon atoms. The random copolymer contains 50 to 90 mol % of ethylene. The random copolymer has an intrinsic viscosity [η] of 0.3 to 10 dl/g measured in decalin at 30°C.

    摘要翻译: 无规共聚物包括各自具有下式的重复单元: 其中R 1至R 1代表氢原子或具有或不具有R 5的烷基与R 6或R 1'通过亚烷基键合 具有1至3个碳原子的基团。 无规共聚物含有50〜90mol%的乙烯。 无规共聚物在30℃下在十氢化萘中测得的特性粘度η为0.3-10dl / g

    High-density liquid fuel
    5.
    发明公开
    High-density liquid fuel 失效
    高密度液体燃料

    公开(公告)号:EP0235720A3

    公开(公告)日:1988-02-03

    申请号:EP87102544

    申请日:1987-02-23

    IPC分类号: C10L01/04

    CPC分类号: C10L1/04

    摘要: The present invention provides a high-density fuel oil which is suitable for rockets and jet engines and which mainly comprises a tetracyclo (7.3.1. 0 2,7 . 1 7,11 ) tetradecane deriva- t i ve represented by the general formula:
    wherein each of m and n is 0,1 or 2, and the sum of m and n is 2 or less.

    摘要翻译: 本发明提供一种适用于火箭和喷气发动机的高密度燃料油,其主要包含由以下通式表示的四环(7.3.1.0.2,7.17,11)十四烷衍生物:其中每个 m和n是0,1或2,并且m和n之和是2或更小。

    Substrate having light-shielding layer, method for forming same and liquid crystal display device
    7.
    发明公开
    Substrate having light-shielding layer, method for forming same and liquid crystal display device 失效
    基板具有遮光层,使得相同的,并且液晶显示器的方法。

    公开(公告)号:EP0627663A1

    公开(公告)日:1994-12-07

    申请号:EP94303859.6

    申请日:1994-05-27

    IPC分类号: G03C7/12 G02F1/1335

    CPC分类号: G02F1/133512 G03F7/0007

    摘要: A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1 × 10² ohm·cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

    摘要翻译: 一种用于制备具有光屏蔽层的基板的方法包括形成形成在透明基片的透明导电层上的光敏涂层的电影,通过薄膜掩模曝光的光敏涂层参展透光性,删除和显影的涂布膜 暴露透明导电层和电沉积的露出透明导电层上的暗色调的涂层用于形成遮光层,并加热该遮光层。 具有遮光层的基材具有1×10的体积电阻率<2> ohm.cm或更高,并且可以使用一种用于在液晶显示装置中的TFT阵列基板反电极基片。

    Process for producing oxazolone derivatives
    8.
    发明公开
    Process for producing oxazolone derivatives 失效
    Verfahren zur Herstellung von Oxazolon-Derivaten。

    公开(公告)号:EP0344963A2

    公开(公告)日:1989-12-06

    申请号:EP89305249.8

    申请日:1989-05-24

    IPC分类号: C07D263/42

    CPC分类号: C07D263/42

    摘要: A process for producing oxazolone derivatives, usable as important starting materials for medicines and pesticides, of the following general formula (III) by reacting a compound of the general formula (I) with a compound of the general formula (II) in the presence of an aliphatic tertiary amine:
    wherein Ar represents an aromatic hydrocarbon residue, R¹ , R², R³ and R⁴ each represent a hydrogen atom, a halogen atom or an organic residue, R⁵ represents a hydrocarbon residue and X represents a halogen atom.

    摘要翻译: 通式(I)的化合物与通式(II)的化合物在通式(I)的化合物的存在下反应,制备可用作药物和农药的重要原料的恶唑酮衍生物的下列通式(III)的方法: 脂族叔胺:其中Ar表示芳族烃残基,R 1,R 2,R 3和R 4各自表示氢原子,卤素原子或有机残基R <5>表示烃残基,X表示卤素原子。

    High-density liquid fuel
    10.
    发明公开
    High-density liquid fuel 失效
    高密度的液体燃料。

    公开(公告)号:EP0235720A2

    公开(公告)日:1987-09-09

    申请号:EP87102544.1

    申请日:1987-02-23

    IPC分类号: C10L1/04

    CPC分类号: C10L1/04

    摘要: The present invention provides a high-density fuel oil which is suitable for rockets and jet engines and which mainly comprises a tetracyclo (7.3.1. 0 2,7 . 1 7,11 ) tetradecane deriva- t i ve represented by the general formula:
    wherein each of m and n is 0,1 or 2, and the sum of m and n is 2 or less.