利索-全球专利检索

  1. 登录
  2. 注册
发明公开
EP0448346A1 Vapor-phase deposition apparatus and vapor-phase deposition method 失效
Vorrichtung und Verfahren zur Dampfphasenabscheidung。

Vapor-phase deposition apparatus and vapor-phase deposition method
摘要：
A vapor-phase deposition apparatus comprises substrate-supporting unit (4, 10, 11) for supporting a substrate (3), heater (6) for heating substrate-supporting unit (4, 10, 11), and gas-supplying unit (9) for supplying gas for forming a thin film on the substrate (3) supported by the substrate-supporting unit (4, 10, 11). The substrate-supporting unit (4, 10, 11) includes a first member (4) to be heated to a predetermined temperature by the heater (6), a second member (10) for supporting a peripheral part of the substrate (3), and a support member (11) for supporting the second member (10) on the first member (4) and located outside a periphery of the substrate (3).
摘要（中）：

气相沉积装置包括用于支撑基板（3）的基板支撑单元（4,10,11），用于加热基板支撑单元（4,10,11）的加热器（6）和气体供应单元 9），用于在由基板支撑单元（4,10,11）支撑的基板（3）上提供用于形成薄膜的气体。 基板支撑单元（4,10,11）包括通过加热器（6）加热到预定温度的第一构件（4），用于支撑基板（3）的周边部分的第二构件（10） ，以及用于将所述第二构件（10）支撑在所述第一构件（4）上并位于所述基板（3）的外围的支撑构件（11）。

公开/授权文献
信息查询
Global Dossier Espacenet
0/0