发明公开
EP0457076A3 Method for producing synthetic diamond thin film, the thin film and device using it
失效
生产合成金刚石薄膜的方法,薄膜和使用其的装置
- 专利标题: Method for producing synthetic diamond thin film, the thin film and device using it
- 专利标题(中): 生产合成金刚石薄膜的方法,薄膜和使用其的装置
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申请号: EP91106700.7申请日: 1991-04-25
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公开(公告)号: EP0457076A3公开(公告)日: 1992-12-16
- 发明人: Muranaka, Yasushi , Yamashita, Hisao , Miyadera, Hiroshi
- 申请人: HITACHI, LTD.
- 申请人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构: Patentanwälte Beetz - Timpe - Siegfried Schmitt-Fumian - Mayr
- 优先权: JP108797/90 19900426; JP54775/91 19910319
- 主分类号: C23C16/26
- IPC分类号: C23C16/26
摘要:
The present invention provides a method for producing a synthetic diamond thin film (2) which comprises decomposing with microwave a raw material gas containing at least one compound selected from the group consisting of carbon monoxide, carbon dioxide and a hydrocarbon and hydrogen or hydrogen and oxygen to produce a plasma and contacting the plasma with the surface of a substrate (1) held outside the area irradiated with the microwave to form a diamond thin film (2) on the substrate (1). The present invention further provides an apparatus for producing a synthetic diamond thin film and a synthetic diamond thin film and devices in which the synthetic diamond thin film is used.
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