Disclosed is a method for fabricating complementary heterojunction bipolar transistors on a common substrate. The method comprises the steps of depositing a PNP profile (14) by molecular beam epitaxy on an appropriate substrate (12) and then depositing a layer of silicon nitride (16) on the PNP profile just deposited. The substrate is then heated in a vacuum in order to densify the silicon nitride. A mask (20) and resist layer (18) are used to produce the desired PNP profile patterns. The NPN profile (22) is deposited on the area of the substrate (12) etched away as well as on the silicon nitride layer (16) protecting the already deposited PNP layers. The NPN profile (22) is then patterned using a resist (24) and masking process. The polycrystalline NPN area on top of the silicon nitride layer and the remaining silicon nitride layer are etched away forming two adjacent complementary NPN and PNP profiles on a common substrate. In the fabrication of the heterojunction bipolar transistor circuits, the P-ohmic contacts on both the NPN and PNP materials is evaporated at the appropriate locations simultaneously. All of the N-ohmic contacts are also deposited simultaneously. By this, the complementary dual heterojunction bipolar transistor device can be effectively fabricated with excellent DC and microwave capabilities.