发明公开
EP0588552A3 Method and apparatus for charging a photoconductive surface to a uniform potential
失效
用于将光导表面充电至均匀电位的方法和设备
- 专利标题: Method and apparatus for charging a photoconductive surface to a uniform potential
- 专利标题(中): 用于将光导表面充电至均匀电位的方法和设备
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申请号: EP93307082.3申请日: 1993-09-08
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公开(公告)号: EP0588552A3公开(公告)日: 1994-08-03
- 发明人: Daunton, Clive R. , Kopko, John J. , Sampath, Ravi
- 申请人: XEROX CORPORATION
- 申请人地址: Xerox Square Rochester New York 14644 US
- 专利权人: XEROX CORPORATION
- 当前专利权人: XEROX CORPORATION
- 当前专利权人地址: Xerox Square Rochester New York 14644 US
- 代理机构: Johnson, Reginald George
- 优先权: US945184 19920915
- 主分类号: G03G15/02
- IPC分类号: G03G15/02
摘要:
An apparatus for charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source includes a first mechanism (34) for charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (35). The apparatus further includes a second mechanism (36) for charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the surface is charged to the substantially uniform potential of the first polarity by the first charging mechanism (34) and before the surface is exposed to the light source at the exposure station (35). Similarly, a method of charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source, includes the steps of (1) charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (79) ; and (2) charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the first polarity charging step and before the surface is exposed to the light source at the exposure station (35).
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