公开(公告)号：EP0588552B1

公开(公告)日：1998-04-08

申请号：EP93307082.3

申请日：1993-09-08

申请人： XEROX CORPORATION

发明人： Daunton, Clive R. ,  Kopko, John J. ,  Sampath, Ravi

IPC分类号： G03G15/02

CPC分类号： G03G15/0266 ,  Y10S430/102

公开(公告)号：EP0588552A3

公开(公告)日：1994-08-03

申请号：EP93307082.3

申请日：1993-09-08

申请人： XEROX CORPORATION

发明人： Daunton, Clive R. ,  Kopko, John J. ,  Sampath, Ravi

IPC分类号： G03G15/02

CPC分类号： G03G15/0266 ,  Y10S430/102

摘要： An apparatus for charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source includes a first mechanism (34) for charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (35). The apparatus further includes a second mechanism (36) for charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the surface is charged to the substantially uniform potential of the first polarity by the first charging mechanism (34) and before the surface is exposed to the light source at the exposure station (35). Similarly, a method of charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source, includes the steps of (1) charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (79) ; and (2) charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the first polarity charging step and before the surface is exposed to the light source at the exposure station (35).

摘要翻译： 一种用于在具有用于清洁表面的清洁站（79）和用于将表面暴露于光源的曝光站（35）的印刷机中将光导表面充电为基本均匀的电位的设备包括：第一机构（34），用于 在表面在清洁站（35）处被清洁后，将表面充电为基本均匀的第一极性电位。 该装置还包括第二机构（36），用于在表面被第一充电机构（34）充电到第一极性的基本均匀的电位之后，将表面充电到与第一极性相反的第二极性的基本均匀的电位， 并且在表面暴露于曝光台（35）处的光源之前。 类似地，一种在具有用于清洁表面的清洁站（79）和用于将表面暴露于光源的曝光站（35）的印刷机中将光导表面充电为基本均匀的电位的方法包括以下步骤： 1）在所述清洁站（79）清洁所述表面之后，将所述表面充电为基本上均匀的第一极性电位; 和（2）在第一极性充电步骤之后和曝光台（35）的表面暴露于光源之前，将表面充电到与第一极性相反的第二极性的基本均匀的电位。

公开(公告)号：EP0588552A2

公开(公告)日：1994-03-23

申请号：EP93307082.3

申请日：1993-09-08

申请人： XEROX CORPORATION

发明人： Daunton, Clive R. ,  Kopko, John J. ,  Sampath, Ravi

IPC分类号： G03G15/02

CPC分类号： G03G15/0266 ,  Y10S430/102

摘要： An apparatus for charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source includes a first mechanism (34) for charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (35). The apparatus further includes a second mechanism (36) for charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the surface is charged to the substantially uniform potential of the first polarity by the first charging mechanism (34) and before the surface is exposed to the light source at the exposure station (35). Similarly, a method of charging a photoconductive surface to a substantially uniform potential in a printing machine having a cleaning station (79) for cleaning the surface and an exposure station (35) for exposing the surface to a light source, includes the steps of (1) charging the surface to a substantially uniform potential of a first polarity after the surface is cleaned at the cleaning station (79) ; and (2) charging the surface to a substantially uniform potential of a second polarity opposite to the first polarity after the first polarity charging step and before the surface is exposed to the light source at the exposure station (35).

摘要翻译： 一种用于在印刷机充电的光敏表面上以大致均匀的电位具有清洁站（79），用于清洁表面，并在曝光站（35），用于将所述表面暴露于光源的装置包括用于在第一机构（34） 表面充电到第一极性的基本均匀的电势的表面在清洁站（35）进行清洗后。 该装置还包括用于在表面充电到第二极性相反的基本上均匀的电势的表面通过第一充电机构充电到第一极性的大致均匀的电位后的第一极性的第二机构（36）（34） 和表面之前被暴露于在曝光站（35）的光源。 类似地，在印刷机充电的光敏表面上以大致均匀的电位具有清洁站（79），用于清洁表面，并在曝光站（35），用于将表面暴露于光源的方法，包括以下步骤：（ 1）表面充电到第一极性的基本均匀的电势的表面在清洁站（79）进行清洗之后; 和（2）的表面充电至一第二极性的基本均匀的电势相反的第一极性的第一极性充电步骤之后和之前的表面被暴露于在曝光站（35）的光源。