发明授权
- 专利标题: METHOD AND APPARATUS FOR CLEAVING SEMICONDUCTOR WAFERS
- 专利标题(中): 方法和设备半导体板列
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申请号: EP92917673.3申请日: 1992-08-14
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公开(公告)号: EP0599937B1公开(公告)日: 1996-01-10
- 发明人: SMITH, Colin , KAUFMAN, Kalman , MAZOR, Isaac , CHEN, Elik , VILENSKI, Dan
- 申请人: SELA CO.-SEMICONDUCTOR ENGINEERING 1992 LTD.
- 申请人地址: P.O. Box 14 31000 Haifa IL
- 专利权人: SELA CO.-SEMICONDUCTOR ENGINEERING 1992 LTD.
- 当前专利权人: SELA CO.-SEMICONDUCTOR ENGINEERING 1992 LTD.
- 当前专利权人地址: P.O. Box 14 31000 Haifa IL
- 代理机构: Modiano, Guido, Dr.-Ing.
- 优先权: IL99191 19910814; IL102595 19920722
- 国际公布: WO9304497 19930304
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method and apparatus are described for cleaving a relatively thin semiconductor wafer for inspecting a target feature on a workface thereof by: producing, on a first lateral face of the semiconductor wafer, laterally of the workface on one side of the target feature, an indentation in alignment with the target feature; and inducing, e.g., by impact, in a second lateral face of the semiconductor wafer, laterally of the workface on the opposite side of the target feature, a shock wave substantially in alignment with the target feature and the indentation on the first lateral face, to split the semiconductor wafer along a cleavage plane essentially coinciding with the target feature and the indentation.
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