For manufacturing an at least substantially transparent conductor pattern or a liquid crystal display device provided with such a conductor pattern, an at least substantially transparent conducting layer (3) and a metal layer (4) are successively provided on a substrate (1) and, while masking with an etching mask (5), exposed to an etching bath. According to the invention, the etching bath contains a first etchant for the metal layer (4) and a second etchant for the underlying transparent conducting layer (3), while the bulk etching rate of the metal layer in the first etchant is smaller than the bulk etching rate of the transparent conducting layer in the second etchant. Thus, a conductor pattern can be obtained which has an eminent pattern and edge definition and bevelled edges whose angle of inclination preferably ranges between 25° and 65°.