A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (71) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).