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公开(公告)号：EP0867036A1
公开(公告)日：1998-09-30
申请号：EP96939061.0
申请日：1996-11-15
发明人： GOEDICKE, Klaus , FIETZKE, Fred , RESCHKE, Jonathan , HEMPEL, Wolfgang , SCHEFFEL, Bert , METZNER, Christoph , SCHILLER, Siegfried
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Known methods and devices for pre-treatment of electrically conducting and non-conducting substrates require a relatively high level of technical outlay and are difficult to incorporate into the following coating process. Pre-treatment frequently does not ensure the adhesion required for coating. The invention proposes to maintain a low pressure glow discharge between the substrate to be cleaned and a counter-electrode. The substrate is periodically alternately switched as a cathode or anode, the frequency of the alternation being set in the range of from 1 Hz to 1000 Hz and the pulse lengths and/or the discharge voltage being independently adjustable. The method is used as a preliminary process for the coating of substrates which require an adhesive layer. Cutting tools, in particular, made of steel, hard metal or ceramic are treated before being coated.
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公开(公告)号：EP0734459A1
公开(公告)日：1996-10-02
申请号：EP95901341.0
申请日：1994-11-22
发明人： KIRCHHOFF, Volker , GOEDICKE, Klaus , NEUMANN, Manfred , RESCHKE, Jonathan , SCHILLER, Siegfried
CPC分类号： C23C14/32
摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.
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3.发明公开VERFAHREN ZUR ANPASSUNG DES GENERATORS BEI BIPOLAREN NIEDERDRUCK-GLIMMPROZESSEN 失效方法发电机的双极性低压力调整GLIMMPROZESSEN
公开(公告)号：EP0710429A1
公开(公告)日：1996-05-08
申请号：EP94920881.0
申请日：1994-07-13
CPC分类号： H01J37/32018 , H01J37/32036 , H05H1/46
摘要： The generator must be statically and dynamically matched to the electrodes in the high power and frequency range in order to perform dipolar low-pressure glow processes. The prior art processes either require considerable complexity or are not usable in the range. According to the invention, the operating time during the positive and/or negative half-wave is controlled in such a way that no power is fed to the glow device, at least during the time of a part of a negative and/or positive half-wave. The invention is applicable to plasma surface treatment, the separation of layers from the plasma and plasma-enhanced surface cleaning.
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公开(公告)号：EP0954876B1
公开(公告)日：2003-04-16
申请号：EP98907975.1
申请日：1998-01-22
发明人： GOEDICKE, Klaus , WINKLER, Torsten , JUNGHÄHNEL, Michael , FIETZKE, Fred , KIRCHHOFF, Volker , RESCHKE, Jonathan
IPC分类号： H01J37/34
CPC分类号： H01J37/34
摘要： Magnetron discharges are pulse-operated to avoid the so-called "arcing". In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power without arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic and machine construction industries.
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公开(公告)号：EP0867036B1
公开(公告)日：2001-07-18
申请号：EP96939061.6
申请日：1996-11-15
发明人： GOEDICKE, Klaus , FIETZKE, Fred , RESCHKE, Jonathan , HEMPEL, Wolfgang , SCHEFFEL, Bert , METZNER, Christoph , SCHILLER, Siegfried
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Known methods and devices for pre-treatment of electrically conducting and non-conducting substrates require a relatively high level of technical outlay and are difficult to incorporate into the following coating process. Pre-treatment frequently does not ensure the adhesion required for coating. The invention proposes to maintain a low pressure glow discharge between the substrate to be cleaned and a counter-electrode. The substrate is periodically alternately switched as a cathode or anode, the frequency of the alternation being set in the range of from 1 Hz to 1000 Hz and the pulse lengths and/or the discharge voltage being independently adjustable. The method is used as a preliminary process for the coating of substrates which require an adhesive layer. Cutting tools, in particular, made of steel, hard metal or ceramic are treated before being coated.
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公开(公告)号：EP0734459B1
公开(公告)日：1999-02-03
申请号：EP95901341.8
申请日：1994-11-22
发明人： KIRCHHOFF, Volker , GOEDICKE, Klaus , NEUMANN, Manfred , RESCHKE, Jonathan , SCHILLER, Siegfried
CPC分类号： C23C14/32
摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.
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公开(公告)号：EP0725843B1
公开(公告)日：1998-03-04
申请号：EP94929464.9
申请日：1994-10-11
发明人： GOEDICKE, Klaus , SCHEFFEL, Bert , RESCHKE, Jonathan , SCHILLER, Siegfried , KIRCHHOFF, Volker , WERNER, Torsten
CPC分类号： C23C14/562 , C23C14/24 , C23C14/30 , H01J37/3053
摘要： A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (7 ) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).
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8.发明授权VERFAHREN ZUR ANPASSUNG DES GENERATORS BEI BIPOLAREN NIEDERDRUCK-GLIMMPROZESSEN 失效方法发电机的双极性低压力调整GLIMMPROZESSEN
公开(公告)号：EP0710429B1
公开(公告)日：1999-06-23
申请号：EP94920881.3
申请日：1994-07-13
CPC分类号： H01J37/32018 , H01J37/32036 , H05H1/46
摘要： The generator must be statically and dynamically matched to the electrodes in the high power and frequency range in order to perform dipolar low-pressure glow processes. The prior art processes either require considerable complexity or are not usable in the range. According to the invention, the operating time during the positive and/or negative half-wave is controlled in such a way that no power is fed to the glow device, at least during the time of a part of a negative and/or positive half-wave. The invention is applicable to plasma surface treatment, the separation of layers from the plasma and plasma-enhanced surface cleaning.
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公开(公告)号：EP0755461B1
公开(公告)日：1997-11-05
申请号：EP95915754.6
申请日：1995-04-07
发明人： NEUMANN, Manfred , GOEDICKE, Klaus , SCHILLER, Siegfried , RESCHKE, Jonathan , MORGNER, Henry , MILDE, Falk , FIETZKE, Fred
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/562 , H01J37/32706
摘要： The process and appropriate device is designed to facilitate the coating at a high rate of large-area electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings comparatively economically. The substrates are primarily strip-like and are especially plastic foils more than a metre wide. According to the invention, negative and positive voltage pulses are alternately applied in a prior art vacuum coating device to the electrically conductive substrate or, in the case of electrically insulating substrates, to an electrode arranged behind it, e.g. the cooling roller, relative to the plasma or to an electrode at approximately plasma potential. The shape, voltage and duration of the pulses is suitable for the coating purpose and the material. The process is particularly suitable for applying wear and corrosion protection and barrier coatings for use, for example, in the packaging industry.
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10.发明公开
公开(公告)号：EP0725843A1
公开(公告)日：1996-08-14
申请号：EP94929464.0
申请日：1994-10-11
发明人： GOEDICKE, Klaus , SCHEFFEL, Bert , RESCHKE, Jonathan , SCHILLER, Siegfried , KIRCHHOFF, Volker , WERNER, Torsten
CPC分类号： C23C14/562 , C23C14/24 , C23C14/30 , H01J37/3053
摘要： A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (71) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).
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