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EP0735158A2 Sputtering target and its use in the production of an optical recording medium
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Sputtertarget und dessen Verwendung bei der Herstellung eines optischen Aufzeichnungsmediums
- 专利标题: Sputtering target and its use in the production of an optical recording medium
- 专利标题(中): Sputtertarget und dessen Verwendung bei der Herstellung eines optischen Aufzeichnungsmediums
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申请号: EP96105116.6申请日: 1996-03-29
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公开(公告)号: EP0735158A2公开(公告)日: 1996-10-02
- 发明人: Ide, Yukio , Iwasaki, Hiroko , Kageyama, Yoshiyuki , Kaneko, Yujiro , Yamada, Katsuyuki , Shinotsuka, Michiaki , Harigaya, Makoto , Deguchi, Hiroshi
- 申请人: Ricoh Company, Ltd
- 申请人地址: 3-6, 1-chome Nakamagome Ohta-ku Tokyo 143 JP
- 专利权人: Ricoh Company, Ltd
- 当前专利权人: Ricoh Company, Ltd
- 当前专利权人地址: 3-6, 1-chome Nakamagome Ohta-ku Tokyo 143 JP
- 代理机构: Barz, Peter, Dr.
- 优先权: JP100078/95 19950331; JP138636/95 19950512; JP228589/95 19950814; JP32892/96 19960126
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/06 ; C01G30/00 ; G11B7/24 ; G11B7/26 ; G11B7/00
摘要:
A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom.%) of α, β, γ and δ thereof being in the relationship of 0.5 ≦ α α + β + γ + δ = 100 , and a method of producing the above sputtering target is provided. An optical recording medium includes a recording layer containing a phase-change recording material which includes as constituent elements Ag, In, Te and Sb with the respective atomic percents of α, β, γ and δ thereof being in the relationship of 1 ≦ α α + β + γ + δ = 100 , and is capable of recording and erasing information by utilizing the phase change of the recording material in the recording layer. A method of forming the above recording layer for the optical recording medium is also provided. In addition, there is provided an optical recording method using the above-mentioned phase-change optical recording medium.
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