发明公开
- 专利标题： Submerged laser beam irridation equipment
- 专利标题（中）： 淹没激光光束照射设备
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申请号： EP96308173.2申请日： 1996-11-12
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公开(公告)号： EP0775549A3公开(公告)日： 1997-08-20
- 发明人: Onuma, Tsutomu , Matsumoto, Toshimi , Onuma, Akira , Nakamura, Mitsuo , Asano, Choichi , Tamai, Yasumasa , Koide, Hiroo , Kurihara, Masayuki , Funamoto, Takao , Ishikawa, Fuminori
- 申请人： HITACHI, LTD.
- 申请人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人： HITACHI, LTD.
- 当前专利权人： HITACHI, LTD.
- 当前专利权人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构： Calderbank, Thomas Roger
- 优先权： JP305905/95 19951124; JP117322/96 19960513; JP247437/96 19960919
- 主分类号： B23K26/00
- IPC分类号： B23K26/00 ; B23K26/12 ; B23K26/14
摘要：
A submerged laser beam irradiation equipment of the invention provides a high quality submerged laser beam processing of a submerged workpiece using only a small amount of a gas. The submerged laser beam irradiation equipment comprises: a focus lens for focusing a laser beam; a mirror tube which houses the lens; a first nozzle provided to cover the front end of the mirror tube in an irradiating direction of the laser beam; a skirt portion provided at the front end of said first nozzle for preventing water immersion thereinto; and a shutter means operable to open and close provided between said skirt portion and said mirror tube for preventing water immersion to said mirror tube.
公开/授权文献
- EP0775549B1 Submerged laser beam irradiation equipment 公开/授权日：2003-05-14
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