公开(公告)号：EP0775549A3

公开(公告)日：1997-08-20

申请号：EP96308173.2

申请日：1996-11-12

申请人： HITACHI, LTD.

发明人： Onuma, Tsutomu ,  Matsumoto, Toshimi ,  Onuma, Akira ,  Nakamura, Mitsuo ,  Asano, Choichi ,  Tamai, Yasumasa ,  Koide, Hiroo ,  Kurihara, Masayuki ,  Funamoto, Takao ,  Ishikawa, Fuminori

IPC分类号： B23K26/00 ,  B23K26/12 ,  B23K26/14

CPC分类号： B23K26/1224

摘要： A submerged laser beam irradiation equipment of the invention provides a high quality submerged laser beam processing of a submerged workpiece using only a small amount of a gas. The submerged laser beam irradiation equipment comprises: a focus lens for focusing a laser beam; a mirror tube which houses the lens; a first nozzle provided to cover the front end of the mirror tube in an irradiating direction of the laser beam; a skirt portion provided at the front end of said first nozzle for preventing water immersion thereinto; and a shutter means operable to open and close provided between said skirt portion and said mirror tube for preventing water immersion to said mirror tube.

摘要翻译： 本发明的浸没式激光束照射设备仅使用少量气体提供浸没式工件的高质量浸没式激光束处理。 该浸没式激光束照射设备包括：用于聚焦激光束的聚焦透镜; 容纳透镜的镜筒; 第一喷嘴，其设置成在激光束的照射方向上覆盖镜管的前端; 一个设置在所述第一喷嘴前端的裙部，用于防止水浸入其中; 以及可操作的开闭装置，设置在所述裙部和所述镜筒之间，用于防止水浸入所述镜筒。

公开(公告)号：EP0775549B1

公开(公告)日：2003-05-14

申请号：EP96308173.2

申请日：1996-11-12

申请人： Hitachi, Ltd.

发明人： Onuma, Tsutomu ,  Matsumoto, Toshimi ,  Onuma, Akira ,  Nakamura, Mitsuo ,  Asano, Choichi ,  Tamai, Yasumasa ,  Koide, Hiroo ,  Kurihara, Masayuki ,  Funamoto, Takao ,  Ishikawa, Fuminori

IPC分类号： B23K26/00 ,  B23K26/12 ,  B23K26/14

CPC分类号： B23K26/1224

公开(公告)号：EP0775549A2

公开(公告)日：1997-05-28

申请号：EP96308173.2

申请日：1996-11-12

申请人： HITACHI, LTD.

发明人： Onuma, Tsutomu ,  Matsumoto, Toshimi ,  Onuma, Akira ,  Nakamura, Mitsuo ,  Asano, Choichi ,  Tamai, Yasumasa ,  Koide, Hiroo ,  Kurihara, Masayuki ,  Funamoto, Takao ,  Ishikawa, Fuminori

IPC分类号： B23K26/00 ,  B23K26/12 ,  B23K26/14

CPC分类号： B23K26/1224

摘要： A submerged laser beam irradiation equipment of the invention provides a high quality submerged laser beam processing of a submerged workpiece using only a small amount of a gas. The submerged laser beam irradiation equipment comprises: a focus lens for focusing a laser beam; a mirror tube which houses the lens; a first nozzle provided to cover the front end of the mirror tube in an irradiating direction of the laser beam; a skirt portion provided at the front end of said first nozzle for preventing water immersion thereinto; and a shutter means operable to open and close provided between said skirt portion and said mirror tube for preventing water immersion to said mirror tube.

摘要翻译： 本发明的浸没式激光束照射设备使用少量气体提供浸没式工件的高质量浸没式激光束处理。 浸没式激光束照射设备包括：用于聚焦激光束的聚焦透镜; 容纳镜片的镜管; 第一喷嘴，被设置成沿着激光束的照射方向覆盖镜管的前端; 裙部，设置在所述第一喷嘴的前端，用于防止水浸入其中; 以及可操作地打开和关闭设置在所述裙部和所述镜管之间的挡板，用于防止水浸入所述镜管。