发明公开
- 专利标题： A composition and slurry useful for metal CMP
- 专利标题（中）： 组成和泥浆的化学机械抛光金属
-
申请号： EP97309476.6申请日： 1997-11-25
-
公开(公告)号： EP0844290A1公开(公告)日： 1998-05-27
- 发明人: Grumbine, Steven K. , Streinz, Christopher C. , Mueller, Brian L.
- 申请人： CABOT CORPORATION
- 申请人地址： 75 State Street Boston, MA 02109-1806 US
- 专利权人： CABOT CORPORATION
- 当前专利权人： CABOT CORPORATION
- 当前专利权人地址： 75 State Street Boston, MA 02109-1806 US
- 代理机构： Attfield, Donald James
- 优先权： US753482 19961126; US827918 19970408; US891468 19970711
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; C23F3/00 ; H01L21/321
摘要：
A chemical mechanical polishing precursor composition comprising at least one catalyst having multiple oxidation states, and at least one stabilizer, the composition being useful when admixed with an oxidizing agent prior to use to remove metal layers from a substrate. Also disclosed is a chemical mechanical polishing composition comprising an oxidizing agent and at least one catalyst having multiple oxidation sites, the composition being useful when combined with an abrasive or an abrasive pad to remove metal layers from a substrate.
公开/授权文献
- EP0844290B1 A composition and slurry useful for metal CMP 公开/授权日：2002-03-13
信息查询
