发明公开

ELEKTRONISCHE EINRICHTUNG ZUM SCHALTEN ELEKTRISCHER STRÖME, FÜR HOHE SPERRSPANNUNGEN UND MIT GERINGEN DURCHLASSVERLUSTEN
摘要:
A p-n junction (7) is connected between two terminals (2, 3) and comprises between two semiconductor regions (6, 8) a semiconductor with a breakdown field intensity of at least 106 V/cm. A channel region (9) adjoining the p-n junction is provided in a first one of the two semiconductor regions and is connected in series, between the two terminals, to a silicon device (4). The depletion zone (70) of the p-n junction bears the off-state voltage when the silicon device is off-state. A MOSFET is preferably used as the silicon device.
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