A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions (21a,21b,21c), respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate (W) by regular angles, said substrate having alignment marks (M) in a ring-like peripheral mark region (AA).