发明公开
EP0889364A1 Method of treating a support suitable for use in the base of a lithographic printing plate
失效
一种用于载体的治疗方法以及使用该载体的平版印刷版
- 专利标题： Method of treating a support suitable for use in the base of a lithographic printing plate
- 专利标题（中）： 一种用于载体的治疗方法以及使用该载体的平版印刷版
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申请号： EP97202034.1申请日： 1997-07-04
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公开(公告)号： EP0889364A1公开(公告)日： 1999-01-07
- 发明人: Verschueren, Eric , Muys, Bavo , Dierckx, Jan , Van Trier, Jean , Cortens, Wim
- 申请人： AGFA-GEVAERT N.V.
- 申请人地址： Septestraat 27 2640 Mortsel BE
- 专利权人： AGFA-GEVAERT N.V.
- 当前专利权人： AGFA-GEVAERT N.V.
- 当前专利权人地址： Septestraat 27 2640 Mortsel BE
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; B41N3/03 ; B41N1/08
摘要：
The present invention provides a method for obtaining a base to be used as the base of a lithographic printing plate comprising on a hydrophobic support a hydrophilic layer contiguous to said support containing a non-gelatineous hydrophilic (co)polymer or (co)polymer mixture, characterized in that said hydrophobic support is treated with a plasma treatment with an applied power density during the plasma treatment of at least 70 W min/m 2 before applying to said support said hydrophilic layer.
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