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1.发明公开Method of treating a support suitable for use in the base of a lithographic printing plate 失效一种用于载体的治疗方法以及使用该载体的平版印刷版
公开(公告)号：EP0889364A1
公开(公告)日：1999-01-07
申请号：EP97202034.1
申请日：1997-07-04
申请人： AGFA-GEVAERT N.V.
发明人： Verschueren, Eric , Muys, Bavo , Dierckx, Jan , Van Trier, Jean , Cortens, Wim
摘要： The present invention provides a method for obtaining a base to be used as the base of a lithographic printing plate comprising on a hydrophobic support a hydrophilic layer contiguous to said support containing a non-gelatineous hydrophilic (co)polymer or (co)polymer mixture, characterized in that said hydrophobic support is treated with a plasma treatment with an applied power density during the plasma treatment of at least 70 W min/m 2 before applying to said support said hydrophilic layer.
摘要翻译： 本发明提供了能够用作平版印刷版上的疏水性载体包含亲水性层邻接所述支撑含有非胶状亲水性（共）聚合物或（共）聚合物的混合物的碱用于获得基的方法， 在于：所述疏水性载体，其特征是施加到所述前等离子体处理至少70瓦分钟/ m <2>的过程中与在应用功率密度的等离子体处理来处理所述的亲水层的支持。
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2.发明授权Method of treating a support suitable for use in the base of a lithographic printing plate 失效一种用于载体的治疗方法以及使用该载体的平版印刷版
公开(公告)号：EP0889364B1
公开(公告)日：2001-01-10
申请号：EP97202034.1
申请日：1997-07-04
申请人： AGFA-GEVAERT N.V.
发明人： Verschueren, Eric , Muys, Bavo , Dierckx, Jan , Van Trier, Jean , Cortens, Wim
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