发明授权
EP0890432B1 Retort method, resin composition, gas barrier film and method for producing it
失效
Autoklaveverfahren,树脂组合物,气体阻隔性膜和过程及其制备
- 专利标题: Retort method, resin composition, gas barrier film and method for producing it
- 专利标题(中): Autoklaveverfahren,树脂组合物,气体阻隔性膜和过程及其制备
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申请号: EP97939194.3申请日: 1997-09-05
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公开(公告)号: EP0890432B1公开(公告)日: 2006-02-15
- 发明人: TANAKA, Hideaki Kureha Chemical Industry Co., Ltd. , OHBA, Hiroyuki Kureha Chemical Industry Co., Ltd. , SATO, Tomoaki Kureha Chemical Industry Co., Ltd. , HASEGAWA, Tomohisa Kureha Chemical Ind. Co., Ltd.
- 申请人: KUREHA CHEMICAL INDUSTRY CO., LTD.
- 申请人地址: 9-11, Horidome-cho, 1-chome Nihonbashi Chuo-ku Tokyo 103 JP
- 专利权人: KUREHA CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人: KUREHA CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人地址: 9-11, Horidome-cho, 1-chome Nihonbashi Chuo-ku Tokyo 103 JP
- 代理机构: Woods, Geoffrey Corlett
- 优先权: JP25751496 19960906; JP35929796 19961227
- 国际公布: WO1998009813 19980312
- 主分类号: B32B27/36
- IPC分类号: B32B27/36 ; C08G81/02 ; C08J5/18 ; B65D81/24 ; C08L33/02 ; C08L3/02 ; C08L29/04 ; C08F8/14 ; C08F8/44
摘要:
A container for retort packaging, comprising a laminated film having as the outermost layer a layer formed of a cross-linked structure comprising a poly(meth)acrylic acid (A) bonded to a polyalcoholic polymer (B) through an ester bond; and a resin composition characterized by having at least chemical structures (X), (Y) and (Z), a degree of esterification defined by the formula: (degree of esterification) = c/(b + c + d) of 0.01 to 0.5, and a degree of ionization defined by the formula: (degree of ionization) = d/(b + c + d) of 0.01 to 0.9 (wherein b, c, and d represent the molar fractions of the carbon-oxygen double bond of the chemical structures (X), (Y), and (Z), respectively in the resin composition). In chemical structure (X), R0 represents H or CH3; in chemical structure (Y), R0 represents H or CH3; and R represents a structure derived from a polyalcoholic polymer (B); and in chemical structure (Z), R0s, which may be the same or different, represents each H or CH3; Me represents an n-valent metal ion; and n is 1 to 3.
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